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Aluninum Zinc oxide (AZO) Al2O3 doped ZnO

Indium Oxide (In2O3) sputtering targets

Magnesium fluoride (MgF2) crystal evaporation material

Magnesium fluoride (MgF2) sputtering targets

Magnesium (Mg) metal sputtering targets

Tungsten oxide doped Lithium (WO3-Li) sputtering targets

Tungsten boride (WB) sputtering targets

High pure Ytterbium metal sputtering targets

Tungsten boride (WC) sputtering targets

Tungsten oxide (WO3) sputtering targets

Ytterbium oxide Yb2O3

Tungsten metal sputtering targets, crucible, evaporation material

Tellurium metal sputtering targets, evaporation material, telluride

Terbium metal, Terbium oxide, Terbium alloy

Silver copper (Ag-Cu) alloy sputtering targets

Scandium metal, scandium oxide, scandium-aluminum alloy

Selenium(Se) metal sputtering target, lead selenide

Silicon sputtering targets and silicide material

Samarium metal, Samarium oxide, Samarium alloy

Rhenium metal sputtering target, evaporation material

Praseodymium Metal, praseodymium oxide

Lead (Pb) metal

Neodymium metal, neodymium oxide, Nd-Al alloy

Nickel (Ni) metal sputtering targets and evaporation material

Magnesium oxide (MgO) sputtering targets

Molybdenum metal, alloy sputtering target, molybdenum carbide

Lithia (Li2O)

Lutetium (Lu) metal and Lutetium oxide

Lanthanum metal sputtering targets

Indium Metal, Indium Oxide

Iridium metal sputtering targets, Iridium alloy

Iron (Fe) metal sputteirng targets

Hafnium metal,alloy,oxide,compound sputtering targets, evaporation material

Germanium (Ge) Metal, Alloy

Erbium (Er) metal sputtering targets

Copper (Cu) metal sputtering targets

Chromium metal,oxide, alloy sputtering target, evaporation material

Cobalt metal (Co)

Niobium metal, alloy, compound sputtering targets, evoporation material

Boron, Boron carbide B4C, Boron nitride BN Sputteirng targets

Ruthenium sputtering targets

Iridium sputtering targets

Carbide Sputtering Targets

Barium Metal

Antimony Metal, Antimony alloy sputtering targets

Aluminum Metal, Al2O3, Aluminum alloy evaporation material sputtering targets

use for semiconductor fab.14inch size of undope Silicon sputtering targets

Tantalum

Nickel-Chromium alloy

Semiconductor Crystal Material

Tungsten Titanium (WTi) sputtering targets

Titanium Aluminium (Ti-Al) Sputtering targets

rare earth oxide

rare earth metal sputtering targets

Evaporation Material

rare earth-Terbium-Dysprosium-Iron alloys (TbDyFe)

Indium Tin oxide (ITO) In2O3 doped SnO2

sputtering targets

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