sputtering targets and evaporation material:
Material: In2O3
Purity as 99.99%
size: 14"diameter max.
Plate: single piece as 10" max x 5" max.

other about In2O3 material:
In2O3-SnO2 (ITO) targets and thin film coating material, composition as In2O3/SnO2=90/10wt% and 95/5wt%, black color or green color.

Indium-Silicon oxide (In2O3-SiO2) sputtering targets, 99,99%, Indium-Gallium oxide sputteirng targets (IGO), Indium-Zinc-Gallium oxide sputtering targets (IZGO) 

Indium-Zinc oxide [In2O3-ZnO] sputtering targets, 99.99% purity, In2O3/ZnO=90/10wt%, or made in custom, shape of discs round targets, plate, rod, granules

Indium (In) alloy sputtering targets, purity: 99.99%, In-Sn alloy, In-Zn alloy, In-Pb, In-Ag alloy e.t.c  

Indium metal wire, 0.5mm dia, 1mm dia. 2mm dia. e.t.c

use in semiconductor material as Indium arsenide (InAs), Indium selenide (InSe), purity is 99.999%, shape as crystal, granules