• Indium Tin oxide (In2O3-SnO2) ITO sputtering target CAS 50926-11-9
  • Indium Tin oxide (In2O3-SnO2) ITO sputtering target CAS 50926-11-9

Indium Tin oxide (In2O3-SnO2) ITO sputtering target CAS 50926-11-9

Model No.︰

ITO

Brand Name︰

TYR

Country of Origin︰

China

Unit Price︰

US $ 200 / pc

Minimum Order︰

1 pc

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Product Description

 

Indium Tin oxide (In2O3-SnO2) ITO sputtering targets

​Purity: 99.99%

composition: Per requested from customer

 In2O3/SnO2=90/10wt 

In2O3/SnO2=50/50wt,

In2O3/SnO2=60/40wt 

 

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

 Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

​Density: RD>99%

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

 

Indium tin oxide (ITO, or tin-doped indium oxide) is a solid solution of indium(III) oxide (In2O3) and tin(IV) oxide (SnO2), typically 90% In2O3, 10% SnO2 by weight. Its melting point is 1526-1926 oC , Density, 7.120–7.160 g/cm3, Color (in powder form): Pale yellow to greenish yellow, 

depending on SnO2 concentration 

 

It is transparent and colorless in thin layers while in bulk form it is yellowish to grey. In the infrared 

region of the spectrum it acts as a metal-like mirror.

Indium tin oxide is one of the most widely used transparent conducting oxides because of its two chief

 properties, its electrical conductivity and optical transparency, as well as the ease with which it can be 

deposited as a thin film. As with all transparent conducting films, a compromise must be made between

 conductivity and transparency, since increasing the thickness and increasing the concentration of charge 

carriers will increase the material's conductivity, but decrease its transparency.

Thin films of indium tin oxide are most commonly deposited on surfaces by physical vapor deposition. 

Often used is electron beam evaporation, or a range of sputter deposition techniques.

 

Applications: 

 

ITO is often used to make transparent conductive coatings for displays such as liquid crystal displays, flat

 panel displays, plasma displays, touch panels, and electronic ink applications. Thin films of ITO are also 

used in organic light emitting diodes, solar cells, antistatic coatings and EMI shieldings. In organic 

light-emitting diodes, ITO is used as the anode (hole injection layer).

 

ITO films deposited on windshields are used for defrosting aircraft windshields. The heat is generated by 

applying a voltage on the film.

 

Thin film interference caused by ITO defrosting coating on an Airbus cockpit window. The film thickness

 is non-uniform on purpose, preventing uneven removal of ice/frost.

ITO is also used for various optical coatings, most notably infrared-reflecting coatings (hot mirrors) for automotive, and sodium vapor lamp glasses. Other uses include gas 

sensors, antireflection coatings, electro wetting on dielectrics, and Bragg reflectors for VCSEL lasers. 

ITO was also used as a sensor coating in the later Kodak DCS cameras, starting with the Kodak DCS 520,

 as a means of increasing blue channel response.

ITO thin film strain gauges can operate at temperatures up to 1400 °C and can be used in harsh 

environments, e.g. gas turbines, jet engines, and rocket engines.

The primary advantage of ITO compared to AZO as a transparent conductor for LCDs is that ITO can be

 precisely etched into fine patterns. AZO cannot be etched as precisely: It is so sensitive to acid that it 

tends to get over-etched by an acid treatment.

Another benefit of ITO compared to AZO is that if moisture does penetrate,TO will degrade less than

 AZO.

 

 

We also supply below oxie ceramic sputtering targets material:

 

Aluminum Oxide Al2O3 target                                  Aluminum Zinc Oxide Al2O3-ZnO Al-ZnO target

Antimony Oxide Sb2O3 target                                   Antimony Tin Oxide Sb2O3-SnO ATO target

Chromium Oxide Cr2O3 target                                  Copper Oxide CuO, Cu2O target

Cerium Oxide CeO2 Target                                       Cobalt Oxide target CoO, Co2O3, Co3O4 target

Dysprosium Oxide Dy2O3 target                               Eur Oxide Eu2O3 target

Erbium Oxide Er2O3 target                                        Germanium Oxide GeO2 target

Gadolinium Oxide Gd2O3 target                               Gallium Oxide Ga2O3 target

Hafnium Oxide HfO2 target                                       Hafnium Yttrium Oxide HfO2-Y2O3 target

Holmium Oxide Ho2O3 target                                   Iron Oxide Fe2O3, Fe3O4 target

Indium Oxide In2O3 target                                         Indium Zinc Oxide, In2O3-ZnO target

Indium Zinc Gallium Oxide In2O3-ZnO-Ga2O3, IZGO target

Indium Gallium Oxide In2O3-Ga2O3, IGO target

Indium Tin Oxide In2O3-SnO2, ITO target               Lanthanum Oxide La2O3 target

Lutetium Oxide Lu2O3 target                                     Magnesium Oxide MgO target

Molybdenum Oxide MoO3 target                                Manganese Oxide MnO2,MnO target

Nickel Oxide NiO target                                              Niobium Oxide Nb2O5, Nb2Ox target

Neodymium Oxide Nd2O3 target                                Praseodymium Oxide Pr6O11 target

Samarium Oxide Sm2O3 target                                   Scandium Oxide Sc2O3 target

Silicon Dioxide SiO2 target                                        Silicon Monoxide SiO target

Strontium Titanate SrTiO3 target                               Strontium Barium Titanate SrBaTiO3 target

Strontium Ruthenate SrRuO3 target                           Barium Titanate BaTiO3 target

Terbium Oxide Tb4O7 Target                                          Tantalum Oxide Ta2O5, Ta2Ox target

Titanium Oxide TiO, TiO2, Ti2O3, Ti3O5 target

Thulium Oxide Tm2O3 target                                          Tin Oxide SnO, SnO2 target

Tungsten Oxide WO3, WO2.9 target                               Tungsten Lithium Oxide WO3-Li2O target

Ytterbium Oxide Yb2O3 target                                        Yttrium Oxide Y2O3 target

Zircon Oxide ZrO2 target                                                  Zinc Oxide ZnO target

Zirconium Oxide Yttria Stabilized ZrO2-Y2O3, YSZ target

Calcium Oxide CaO target                                                  Cadmium Oxide CdO target

Doped Boron Oxide taret ZnO-B2O3, ZrO2-B2O3 target

Bismuth Oxide Bi2O3 target                                               Bismuth Ferrite BiFeO3 target

Vanadium Oxide V2O5, VO2 target                                  Ruthenium Oxide RuO2 target

Lead Oxide PbO target                                                       LaTiO3, SrTiO3-La, EuTiO3 target

Yttrium Barium Copper Oxide YBCO taret                       Gadolinium Barium Copper Oxide, GdBaCuOx target

LaMnO3 target, LaSrMnOx target                                     Barium Oxide BaO target

Lead zirconate titanate PbZrTiO3, PZT target                   Y3Fe5O12, YIG target

 

 

We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.

 



specification︰ Purity: 99.99%
composition: Per requested from customer
 In2O3/SnO2=90/10wt 
In2O3/SnO2=50/50wt,
In2O3/SnO2=60/40wt 

Diameter: 355.6mm (14") max.
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree
 Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing
Label︰ Indium Tin oxide (In2O3-SnO2) ITO sputtering target

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offering sputtering targets, evaporation material, rare earth metal, rare earth oxide, chemistry reagent

 

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