Titanium diboride TiB2 targets use in RF sputtering CAS 12045-63-5

Titanium diboride (TiB2) sputtering target

Purity: 99.5%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length:<500mm, Width: <250mm, thickness:="">1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Titanium diboride (TiB2) is an extremely hard ceramic which has excellent heat conductivity, oxidation stability and resistance to mechanical erosion. TiB2 is also a reasonable electrical conductor, so it can be used as a cathode material in aluminium smelting and can be shaped by electrical discharge machining.

Molar mass: 69.489 g/mol
Appearance: non lustrous metallic grey
Density: 4.52 g/cm3
Melting point: 3,230 °C (5,850 °F; 3,500 K)

Also, we supplying other boride target material, the list as following:

Cerium Boride              CeB6
Chromium Boride         CrB2

Copper Boride             CuB2

Dysprosium Boride      DyB6

Erbium Boride              ErB6

Gadolinium Boride      GdB6

Holium Boride             HoB6

Hafnium Boride           HfB2

Lanthanum Boride      LaB6

Lutetium Boride,         LuB6

Neodymium Boride    NdB6

Titanium Boride          TiB2

Tantalum Boride        TaB2

Tungsten Boride        W2B5, WB

Vanadium Boride       V2B

Zirconium Boride        ZrB2

Ytterbium Boride        YbB6

Yttrium Boride            YB6

Thulium Boride           TmB6

Terbium Boride          TbB6

Scandium Boride       ScB6

Samarium Boride        SmB6

We have only listed the more popular material. 

Please feel free contact us with any special requirements at any times, we will get back for you ASAP.